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Changes between Version 139 and Version 140 of MD_WSdiffim_photcheck_test20121004


Ignore:
Timestamp:
Mar 5, 2013, 1:21:12 PM (13 years ago)
Author:
Mark Huber
Comment:

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  • MD_WSdiffim_photcheck_test20121004

    v139 v140  
    3636
    3737Exposure (SMF) photometry versus diffim photometry: unless the target is contaminated with background (self or host), photometry at the exposure level will be the better choice for photometry. However, will look at the MD09 example since it covers past/present, most warps are still available (MD09 is the current test field) and does not appear intrinsically variable ([wiki:MD_WSdiffim_photcheck_test20121004#Largesamplediffimphotometryfory-band]).
    38  * appears to be an offset of ~0.08 mag in the PSF photometry on the diffims (PSF mag brighter)
     38 * appears to be an offset of ~0.08 mag in the PSF photometry on the diffims (PSF mag brighter) and from the ppSub photometry
    3939 * photometric error on the diffims is ~30% larger on the WARP-STACK(convolved -- default for MOPS) versus the WARP-STACK(unconvolved -- default for static transients)
    4040