Changes between Version 124 and Version 125 of MD_WSdiffim_photcheck_test20121004

Timestamp:

Mar 1, 2013, 9:30:42 AM (13 years ago)

Author:

Mark Huber

Comment:

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MD_WSdiffim_photcheck_test20121004

@@ -32 +32 @@
 == Issue of photometry offset ==
 
-Exposure (SMF) photometry versus diffim photometry: unless the target is contaminated with background (self or host), photometry at the exposure level will be the better choice for photometry. However, will look at the MD09 example since it covers past/present, most warps are still available (MD09 is the current test field) and does not appear intrinsically variable.
- * appears to be an offset of ~0.08 mag in the PSF photometry on the diffims
+Exposure (SMF) photometry versus diffim photometry: unless the target is contaminated with background (self or host), photometry at the exposure level will be the better choice for photometry. However, will look at the MD09 example since it covers past/present, most warps are still available (MD09 is the current test field) and does not appear intrinsically variable ([wiki:Large sample diffim photometry for y-band]).
+ * appears to be an offset of ~0.08 mag in the PSF photometry on the diffims (PSF mag brighter)
  * photometric error on the diffims is ~30% larger on the WARP-STACK(convolved -- default for MOPS) versus the WARP-STACK(unconvolved -- default for static transients)
 
@@ -716 +716 @@
 Do any of the modifications impact the photometry from the SSdiffims critical for the static transient use?
 
-