Changes between Version 123 and Version 124 of MD_WSdiffim_photcheck_test20121004

Timestamp:

Mar 1, 2013, 9:29:20 AM (13 years ago)

Author:

Mark Huber

Comment:

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MD_WSdiffim_photcheck_test20121004

@@ -32 +32 @@
 == Issue of photometry offset ==
 
-Exposure (SMF) photometry versus diffim photometry: unless the target is contaminated with background (self or host), photometry at the exposure level will be the better choice for photometry. However, look at the MD09 example since covers past/present, most warps are still available (MD09 is the current test field), and does not appear intrinsically variable.
-
-
-Predicted/expected photometry versus exposure photometry: beyond the scope of diffim photometry investigation.
+Exposure (SMF) photometry versus diffim photometry: unless the target is contaminated with background (self or host), photometry at the exposure level will be the better choice for photometry. However, will look at the MD09 example since it covers past/present, most warps are still available (MD09 is the current test field) and does not appear intrinsically variable.
+ * appears to be an offset of ~0.08 mag in the PSF photometry on the diffims
+ * photometric error on the diffims is ~30% larger on the WARP-STACK(convolved -- default for MOPS) versus the WARP-STACK(unconvolved -- default for static transients)
+
+
+
+Predicted/expected photometry versus exposure photometry: beyond the scope of this diffim photometry investigation.