Changes between Version 43 and Version 44 of MD10.refstack.20130715

Timestamp:

Sep 4, 2013, 12:40:58 PM (13 years ago)

Author:

Mark Huber

Comment:

--

MD10.refstack.20130715

@@ -446 +446 @@
 
 
-=== update PV2 test ===
-
-Odd CR losses in PV2 updates
+=== PV2 update test ===
+Part of PV2 is the inclusion of the dynamic mask during chip->warp updates by also updating the camera stage SMF.
+
+Sample --
+
+
+
+==== masking losses ===
+Odd mask lost in PV2 updates -- seems to be limited to 
+{{{
+    PM_SOURCE_MODE_CR_LIMIT
+    PM_SOURCE_MODE_BLEND
+}}}
+
+Was suggested that possibly from photometry not being run on update -- since masks being remade in PV2 updates then lost, while a normal update uses the already defined mask? Since PV2 is mainly for improved inputs to stacks, should be minor and just rejected? (except for low N..)
+
 
 Example -- one masked CR is lost (full reprocessing retains it while the PV2 update method loses it) and one is gained (as with the full reprocessing and should be)
@@ -462 +475 @@
 [[Image(o5503g0240o.s045im_cr_center.jpg,500px)]]
 
- * Mask panels left to right -- (same)
+ * Mask panels left to right -- (same sequence)
 
 [[Image(o5503g0240o.s045mk_cr_center.jpg,500px)]]
 
+
+=== PV2 night stack ===
+
+
+=== PV2 night stack SSdiff ===
 
  
  
-